Products
ProductStripper
Photo-resist is called non-direct material, because it will be removed after process. Photo-resist is used as a hard mask for most purposes, for example, etching, plating…etc.. There are several criterions to select a suitable stripper, not only the etching rate for resist, but also damage for substrate…etc. should be concerned.
| 品名 | 簡介 | 特性 |
|---|---|---|
| SBS-300 | It is NMP based and provides a solution for fast stripping of photoresist. |
1.Fast photoresist stripping speed and wide temperature range for use. |
| SBS-400 | Based on DMSO, it provides a stripping solution with high photoresist dissolving capacity. |
1.High dissolving capacity, suitable for thick film or high number of slices operation. |
| SBS-500 | Based on ether and alcohol, it provides a clean and effective stripping liquid. |
1.Future green products that comply with EU regulations. |