Products

Product

Photo-resist is called non-direct material, because it will be removed after process. Photo-resist is used as a hard mask for most purposes, for example, etching, plating…etc.. There are several criterions to select a suitable stripper, not only the etching rate for resist, but also damage for substrate…etc. should be concerned. 

 

 

 


品名 簡介 特性
SBS-300 It is NMP based and provides a solution for fast stripping of photoresist. 1.Fast photoresist stripping speed and wide temperature range for use.
SBS-400 Based on DMSO, it provides a stripping solution with high photoresist dissolving capacity. 1.High dissolving capacity, suitable for thick film or high number of slices operation.
SBS-500 Based on ether and alcohol, it provides a clean and effective stripping liquid. 1.Future green products that comply with EU regulations.